Lake Washington Institute of Technology Only College in the Northwest to Offer Dentist Test Prep Course

MEDIA CONTACT

Leslie ShattuckDirector, Communications & Marketing(425) 739-8236

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Kirkland, Washington–Lake Washington Institute of Technology (LWTech) is the only college in the Pacific Northwest that is offering an eight-day Dental Prep course. The course, which is designed for international dentists, will provide students with the knowledge to prepare them for the dental school Bench-Test, which is required by most U.S. dental schools as part of their admission process. LWTech will offer the eight-day workshop March 25, 2015 through April 3, 2015 at its Kirkland Campus.

The Dental Test Prep course includes an extensive review of fixed and removable prosthodontics, operative dentistry, and treatment planning. The course also features didactic and hands-on sessions with a low student-teacher ratio in our state-of-the-art dental clinic. Included as part of the course is interviewing technique and a one-day follow-up where students can brush up on their skills prior to taking the exam.

WHO

Lake Washington Institute of Technology

WHAT

Eight-day Dental Test Prep course to prepare international dentists for the dental school Bench-Test.

WHEN

March 25, 2015-April 3, 2015

WHERE

Lake Washington Institute of Technology Kirkland campus at 11605 132nd Avenue NE, Kirkland, Wash. 98034

WHY

Preparing for the Bench-Test gets international dentists one step closer to dental school admission.

For enrollment information contact Rhonda McElroy at (425) 739-8157.

 

About Lake Washington Institute of Technology

As the only public institute of technology in Washington state, Lake Washington Institute of Technology (LWTech) a provides students with the latest cutting edge skills relevant to today’s workplace. LWTech offers six bachelor’s degrees, more than 45 associate degrees, and more than 85 professional certificates in 44 areas of study, including STEM-focused programs in Science, Technology, Engineering, and Math.