Dental Hygiene
LWTech's Bachelor’s of Applied Science in Dental Hygiene degree prepares students to enter the healthcare workforce as Dental Hygienists who are competent in the provision of safe, ethical and effective dental hygiene care. The program aims to provide students with high quality didactic and clinical education in the cognitive, psychomotor, and affective skills of Dental Hygiene as well as the promotion of life-long learning.
Dental Hygiene Program Philosophy
The Lake Washington Institute of Technology Dental Hygiene program believes the function of the Dental Hygienist is to provide safe and effective Dental Hygiene care to help people retain and improve their oral health for greater quality of life. It is the philosophy of the Dental Hygiene program at LWTech to foster the acquisition of Dental Hygiene skills in a safe learning environment that supports communication, collaboration, and critical thinking, and to promote culturally sensitive, ethical, and compassionate care in the dental workplace.
Clinical Experience
Clinical experience is provided at the Lake Washington Institute of Technology Dental Clinic under the supervision of licensed dentists and licensed dental hygienists. Additional clinical experience occurs in a variety of off-campus settings located in the greater Seattle area.
Additional Dental Hygiene Program Information
Students applying to the Dental Hygiene BAS program are selected on a competitive basis called Selective Admission.
As a student who is interested in pursuing admission to the Dental Hygiene program, it is important that you have all of the information you need to be the most competitive applicant to this selective admission program.
BAS Prerequisites
- Entry into the Dental Hygiene program requires completion of LWTech's online application.
- You will receive a Student ID number and an LWTech issued email address.
- You will not be able to fill out the Dental Hygiene BAS application without completing this step.
- All perspective students interested in applying to the Dental Hygiene program are
required to review the Dental Hygiene BAS Advising page prior to applying.
- This page includes an information session as well as other vital information that students must know prior to applying to the Dental Hygiene program.
- Meet all prerequisites as defined on the Dental Hygiene BAS Advising page.
- Review the 2023 Supporting Information Packet.
BAS Application
Application Deadline
Admission Deadline
Deadline extended! January 5, 2023
Financial Aid Priority Deadline
March 15, 2023
Entry Dates
- Summer Quarter
Application Fee
Admissions application fee: $50
Application Preview
To apply to this program, you must create a Self-Service Center account. You may preview the BAS application by downloading a PDF of the first page.
Application Questions?
Contact selective.admission@lwtech.edu only after you have reviewed mandatory application information above.
Additional Admission Considerations
- International Students Apply via Office of International Programs & Global Education
- Adult Education: Basic Education for Adults (BEdA)
- New to Washington State: Learn more about determining residency status
- Justice Involved: Re-Entry Support for Students Who Have Been Justice Involved
- Undocumented citizens: See the residency affidavit and visit the undocumented students page for more information.
Not Sure Where to Start?
Information session dates and information can be found on the Dental Hygiene BAS Advising page.
To be eligible for employment, graduates must also take and pass the National Board Examination and the Washington clinical licensing examination.
Accreditation
This program has received accreditation status from the Commission on Dental Accreditation (COD) which allows students, upon graduation, to take the National Board Examination and the clinical licensing examination in the state where she or he plans to practice.
Explore Careers and Paths in Dental Hygiene
To learn more about transferring to another college or university, please visit our Transferring from LWTech page.
